Real-time Particle Detection in Semiconductor Vacuum Environment

Metal and Non-metal Particles can be Monitored

A particle-detecting integrated circuit that contains a device with a pair of conductive lines positioned in a vacuum environment can detect particles in real time in a semiconductor vacuum environment. The conductive lines are spaced at a critical pitch corresponding to diameters of particles of interest. An impedance measurement system linked to the circuit detects a change in an electrical property (e.g., a short in a current flow or a change in capacitance) of the conductive lines when a particle becomes lodged between the lines (particles smaller than the size of the pitch) or bridges the gap in-between (particles larger than the size of the pitch). A metallic particle larger than the pitch size generates a short in a current flow between the lines, while a non-metallic particle generates a change in capacitance between the lines.

BENEFITS AND FEATURES:

• Detects particles in real time in a semiconductor vacuum environment
• Detects changes in an electrical property
• Monitors metallic or non-metallic particles

APPLICATIONS:

• Photolithography
• Depositing film on semiconductor wafers
• Dopant implanting on semiconductor wafers

Phase of Development - Proof of Concept

Christof Asbach Oberhausen, Germany,

Heinz Fissan Kerken-Aledekerk, Germany