Plasma Synthesis of Nanocrystals
Gas-Phase Nanocrystal Synthesis Technologies Available for Licensing
Three cost effective technologies for creating nanocrystals via a gas-plasma, non-aqueous process are available to license. Gas phase production of these nanocrystals is faster, higher yield and more cost efficient than current processes. The technologies can be optioned for a six month trial period for a $10,000 Try fee to enable testing of the commercial viability of this process to produce nanocrystals for your application.
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The license includes these two technologies:
A novel gas phase method and apparatus effectively grafts organic molecules onto silicon nanocrystals to form a passivation layer. The process produces grafted Group IV nanoparticles quickly, at room temperature and with minimal particle aggregation and diffusional losses. The plasma-treated particles are readily soluble in various nonpolar solvents.
A single-step continuous flow non-thermal plasma process produces luminescent silicon nanocrystals. The nanocrystals, which range between 2 and 8 nm, can be produced within milliseconds. The process involves passing an argon-silane (SiH4) precursor gas mixture through a quartz reactor tube upon which radio-frequency power is applied through copper ring electrodes, generating a radiofrequency (RF) plasma. The nanocrystals created in this unique plasma environment are collected downstream from the plasma and produce consistent, desirable yields, easily scalable through parallelizing.
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