Real-time Particle Detection in Semiconductor Vacuum Environment

IP Status: Issued US Patent; Application #: 11/773,197

Metal and Non-metal Particles can be Monitored

A particle-detecting integrated circuit that contains a device with a pair of conductive lines positioned in a vacuum environment can detect particles in real time in a semiconductor vacuum environment. The conductive lines are spaced at a critical pitch corresponding to diameters of particles of interest. An impedance measurement system linked to the circuit detects a change in an electrical property (e.g., a short in a current flow or a change in capacitance) of the conductive lines when a particle becomes lodged between the lines (particles smaller than the size of the pitch) or bridges the gap in-between (particles larger than the size of the pitch). A metallic particle larger than the pitch size generates a short in a current flow between the lines, while a non-metallic particle generates a change in capacitance between the lines.

MN-IP Try and Buy
Try $5,000 for a six month trial Trial fee is waived for MN companies or if sponsoring $50,000+ research with the University No US patent costs during trial
Buy $20,000 conversion fee (TRY to BUY) Royalty rate of 3% (2% for MN company) Royalty free for first $1M in sales

BENEFITS AND FEATURES:

• Detects particles in real time in a semiconductor vacuum environment
• Detects changes in an electrical property
• Monitors metallic or non-metallic particles

APPLICATIONS:

• Photolithography
• Depositing film on semiconductor wafers
• Dopant implanting on semiconductor wafers

Phase of Development - Proof of Concept

Researchers: David Pui, PhD Professor, Mechanical Engineering, College of Science and Engineering
Yi Liu Researcher, College of Science and Engineering,

Christof Asbach Oberhausen, Germany,

Heinz Fissan Kerken-Aledekerk, Germany